Monash Uni Course
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| Describe the Oxidation process | show 🗑
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| What temperatures do oxidation processes operate at? | show 🗑
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| show | Chemical reaction at the interface, & diffusion of the oxidant through existing oxide layer
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| Types of Chemical Vapour Deposition? | show 🗑
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| Physical Deposition (Sputtering) | show 🗑
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| show | Metal source heated to melting, atoms transported with the vapor to the substrate, 1nm/min
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| Chemical Deposition Process | show 🗑
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| show | Control unwanted gas-phase reactions, improve film uniformity,minimise diffusion effects
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| show | Can take 3hrs for 15nm, only 3 mins for deposition but the rest for controlling temperature and pressure
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| show | Faster than LPCVD,Lower temps are good for components with low melting temp.
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| PECVD Downsides | show 🗑
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| show | Lattice mismatch, differences in thermal expansion coefficients
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| show | Clean wafer, apply primer, rotate, soft bake, exposure and post bake
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| Photolithography - Exposure Methods | show 🗑
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| Types of Etching | show 🗑
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| Wet etchant to remove Si isotropically | show 🗑
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| Wet etchant to remove SiN (but not Si or SiO2) | show 🗑
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| show | HF
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